Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists.
| Autor: | Varanasi, Pushkara R., Cornett, Kathleen M., Katnani, Ahmad D. |
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| Zdroj: | Proceedings of SPIE; Nov1998 Part 2, Issue 1, p512-523, 12p |
| Databáze: | Complementary Index |
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