Effects of underlayer on performance of bilayer resists for 248-nm lithography.
| Autor: | Babich, Katherina, Callegari, Alessandro, Petrillo, Karen E., Simons, John P., LaTulipe, Douglas C., Angelopoulos, Marie, Lin, Qinghuang |
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| Zdroj: | Proceedings of SPIE; Nov1998 Part 2, Issue 1, p726-734, 9p |
| Databáze: | Complementary Index |
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