ArF excimer laser lithography with bottom antireflective coating.
| Autor: | Kishimura, Shinji, Takahashi, Makoto, Nakazawa, Keisuke, Ohfuji, Takeshi, Sasago, Masaru, Uematsu, Masaya, Ogawa, Tohru, Ohtsuka, Hiroshi |
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| Zdroj: | Proceedings of SPIE; Nov1998 Part 2, Issue 1, p310-321, 12p |
| Databáze: | Complementary Index |
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