Resist charging in electron-beam lithography.
| Autor: | Bai, Min, Pickard, Daniel S., Tanasa, Corina, McCord, Mark A., Berglund, C. Neil, Pease, Roger Fabian W. |
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| Zdroj: | Proceedings of SPIE; Nov1998 Part 2, Issue 1, p383-388, 6p |
| Databáze: | Complementary Index |
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