Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials.
| Autor: | Han, Sang-In, Weisbrod, Eric, Wasson, James R., Gregory, Rich, Xie, Qianghua, Mangat, Pawitter J. S., Hector, Scott D., Dauksher, William J., Rosfjord, Kristine M. |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p261-270, 10p |
| Databáze: | Complementary Index |
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