Process latitude measurements and their implications for CD control in EUV lithography.
| Autor: | Cobb, Jonathan, Peters, Richard, Postnikov, Sergei, Hector, Scott D., Lu, Bing, Weisbrod, Eric, Wasson, James R., Mangat, Pawitter, O'Connell, Donna |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p43-52, 10p |
| Databáze: | Complementary Index |
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