Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness.
| Autor: | Valley, John F., Poduje, Noel, Sinha, Jaydeep, Judell, Neil, Wu, Jie, Boonman, Marc, Tempelaars, Sjef, van Dommelen, Youri, Kattouw, Hans, Hauschild, Jan, Hughes, William, Grabbe, Alexis, Stanton, Les |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p1098-1108, 11p |
| Databáze: | Complementary Index |
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