Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography.
| Autor: | Ke, Chih-Ming, Hung, Hsueh-Liang, Chang, Anderson, Chen, Jeng-Horng, Gau, Tsai-Sheng, Ku, Yao-Ching, Lin, Burn J., Otaka, Tadashi, Ueda, Kazuhiro, Kawada, Hiroki, Nomura, Hiroaki, Ren, Nelson |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p173-182, 10p |
| Databáze: | Complementary Index |
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