Methods for evaluating lithographic performance of exposure tools for the 45-nm node: ECD and scatterometry.
| Autor: | Huang, Karen, Rice, Bryan J., Coombs, Brian, Freed, Regina |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p494-502, 9p |
| Databáze: | Complementary Index |
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