Sub-50-nm isolated line and trench width artifacts for CD metrology.
| Autor: | Tortonese, Marco, Lorusso, Gian, Blanquies, Rene M., Prochazka, Jerry, Grella, Luca |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p647-656, 10p |
| Databáze: | Complementary Index |
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