Barometric pressure compensation to control photoresist film thickness.

Autor: Vishnu, Vandana, Randall, Mai, Pillette, Carole J., Katayama, Kyoshige, Omura, Kazuhisa, Uemura, Ryoichi, Tomita, Hiroshi, Ando, Ryoji, Ogata, Kunie, Maejima, Hiromitsu, DiDonato, Anthony, Nicholson, Jim
Zdroj: Proceedings of SPIE; Nov2004, Issue 1, p958-966, 9p
Databáze: Complementary Index