Advances in resist pattern transfer process using 157-nm lithography.
| Autor: | Furukawa, Takamitsu, Hagiwara, Takuya, Kawaguchi, Etsurou, Matsunaga, Kentaro, Suganaga, Toshifumi, Itani, Toshiro, Fujii, Kiyoshi |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p1064-1073, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|