Optimized filtration for reduced defectivity and improved dispense recipe in 193-nm BARC lithography.
| Autor: | Do, Phong, Pender, Joe, Lehmann, Thomas, Mc Ardle, Leo P., Gotlinsky, Barry, Mesawich, Michael |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p1215-1222, 8p |
| Databáze: | Complementary Index |
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