Evaluation of outgassing from a fluorinated resist for 157-nm lithography.
| Autor: | Irie, Shigeo, Fujii, Kiyoshi, Itakura, Yasuo, Kawasa, Youichi, Egawa, Keiji, Uchino, Ikuo, Sumitani, Akira, Itani, Toshiro |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p226-237, 12p |
| Databáze: | Complementary Index |
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