Design of dissolution inhibitors for chemically amplified photolithographic systems.
Autor: | Chambers, Charles R., Kusumoto, Shiro, Osborn, Brian P., Vasudev, Alok, Ootani, Michitaka, Walthal, Leonidas, McMichael, Hale, Zimmerman, Paul A., Conley, Willard E., Willson, C. Grant |
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Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p360-368, 9p |
Databáze: | Complementary Index |
Externí odkaz: |