Design of dissolution inhibitors for chemically amplified photolithographic systems.

Autor: Chambers, Charles R., Kusumoto, Shiro, Osborn, Brian P., Vasudev, Alok, Ootani, Michitaka, Walthal, Leonidas, McMichael, Hale, Zimmerman, Paul A., Conley, Willard E., Willson, C. Grant
Zdroj: Proceedings of SPIE; Nov2004, Issue 1, p360-368, 9p
Databáze: Complementary Index