Influence of resin properties to resist performance at ArF lithography.
| Autor: | Yoon, Sangwoong, Kim, Myungsun, Lee, Hong, Kim, Do Y., Kim, Young Hoon, Kim, Boo Deuk, Kim, Jae Hyun, Kim, Kyung-Mee, Lee, Shi Yong, Kim, Young Ho, Chon, Sang-Mun |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p583-590, 8p |
| Databáze: | Complementary Index |
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