Single-layer and bilayer resist processes for EUV-type integrations.
| Autor: | Peters, Richard D., Parker, Colita, Cobb, Jonathan, Luckowski, Eric, Weisbrod, Eric, Dauksher, Bill |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p746-756, 11p |
| Databáze: | Complementary Index |
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