Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions.
| Autor: | Masuda, Seiya, Kobayashi, Masakazu, Kim, Woo-Kyu, Anyadiegwu, Clement, Padmanaban, Munirathna, Dammel, Ralph R., Tanaka, Keiichi, Yamada, Yoshiaki |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p819-829, 11p |
| Databáze: | Complementary Index |
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