Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond.
| Autor: | Hsu, Shu-Hao, Fang, Shu-Ping, Huang, I. Hsuing, Lin, Benjamin S., Hung, Kuei-Chun |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p1214-1224, 11p |
| Databáze: | Complementary Index |
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