Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results.
| Autor: | Capetti, Gianfranco, Bollin, Maddalena, Pepe, Annalisa, Cotti, Gina, Loi, Sara, Iessi, Umberto |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p881-893, 13p |
| Databáze: | Complementary Index |
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