Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography.
| Autor: | Chang, Ching-Hsu, Schacht, Jochen, Lin, Benjamin S., Hung, Kuei-Chun, Huang, I. Hsuing |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p902-910, 9p |
| Databáze: | Complementary Index |
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