Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024.
| Autor: | Irmscher, Mathias, Beyer, Dirk, Butschke, Joerg, Hudek, Peter, Koepernik, Corinna, Plumhoff, Jason, Rausa, Emmanuel, Sato, Mitsuru, Voehringer, Peter |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p46-57, 12p |
| Databáze: | Complementary Index |
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