Photomask ADI, AEI, and QA measurements using normal incidence optical CD metrology.
| Autor: | Apak, Ebru, Sarathy, T. P., McGahan, William A., Rovira, Pablo I., Hoobler, Ray J. |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p708-719, 12p |
| Databáze: | Complementary Index |
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