Low-thermal expansion material for EUVL photomask substrate application.
| Autor: | Nakajima, Kousuke, Kawasaki, Nobuo, Nakajima, Toshihide |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p812-823, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Nakajima, Kousuke, Kawasaki, Nobuo, Nakajima, Toshihide |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p812-823, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|