Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks.
| Autor: | Plumhoff, Jason, Constantine, Chris, Reelfs, Brad H. |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p88-93, 6p |
| Databáze: | Complementary Index |
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