Effect of electrostatic chucking on EUVL mask flatness.

Autor: Mikkelson, Andrew R., Engelstad, Roxann L., Lovell, Edward G., Aschke, Lutz, Rueggeberg, Frauke, Sobel, Frank
Zdroj: Proceedings of SPIE; Nov2004, Issue 1, p120-128, 9p
Databáze: Complementary Index