Quartz etch process to improve etch depth linearity and uniformity using Mask Etcher IV.
| Autor: | Srinivasan, Sunil, Plumhoff, Jason, Westerman, Russ, Johnson, Dave J., Constantine, Chris |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p176-182, 7p |
| Databáze: | Complementary Index |
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