Next-generation DUV ALTA mask patterning capabilities.
| Autor: | Allen, Paul C., Bohan, Michael J., Christenson, Eric R., Hamaker, H. Christopher, Howells, Sam C., Kenan, Boaz, Pirogovsky, Peter, Sadiq, Malik K., Teitzel, Robin L., White, Michael C., Ungureit, Michael, Wickstrom, Alan, Kiefer, Robert, Jackson, Curt |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p279-290, 12p |
| Databáze: | Complementary Index |
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