Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection.
| Autor: | Hsu, Stephen, Chu, Tsann-bin, Van Den Broeke, Douglas, Chen, J. Fung, Hsu, Michael, Corcoran, Noel P., Volk, William, Ruch, Wayne E., Sier, Jean-Paul E., Hess, Carl E., Lin, Benjamin S., Yu, Chun-Chi, Huang, George |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p711-722, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|