Characterization of an acetal-based chemically amplified resist for 257-nm laser mask fabrication.
| Autor: | Rathsack, Benjamen M., Tabery, Cyrus E., Albelo, Jeff A., Buck, Peter D., Willson, C. Grant |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p578-588, 11p |
| Databáze: | Complementary Index |
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