Mask manufacturing contribution on 248-nm and 193-nm lithography performances.

Autor: Barberet, Alexandra, Fanget, Gilles L., Richoilley, Jean-Charles, Tissier, Michel, Quere, Yves
Zdroj: Proceedings of SPIE; Nov2001, Issue 1, p902-910, 9p
Databáze: Complementary Index