Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools.
Autor: | Stenkamp, Dirk, Kienzle, O., Orchowski, Alexander, Rau, Wigbert D., Weickenmeier, A., Benner, G., Wetzke, M., Waskiewicz, Warren K., Katsap, Victor, Zhu, Xieqing, Liu, Haoning, Munro, Eric, Rouse, John A. |
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Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p115-125, 11p |
Databáze: | Complementary Index |
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