Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools.
| Autor: | Stenkamp, Dirk, Kienzle, O., Orchowski, Alexander, Rau, Wigbert D., Weickenmeier, A., Benner, G., Wetzke, M., Waskiewicz, Warren K., Katsap, Victor, Zhu, Xieqing, Liu, Haoning, Munro, Eric, Rouse, John A. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p115-125, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|