Application of advanced 100-kV EB writer EB-X3 for 100-nm node x-ray mask fabrication.
| Autor: | Watanabe, Hiroshi, Nakayama, Yoshinori, Tsuboi, Shinji, Ezaki, Mizunori, Aoyama, Hajime, Matsui, Yasuji, Morosawa, Tetsuo, Oda, Masatoshi |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p323-333, 11p |
| Databáze: | Complementary Index |
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