Development of data conversion system for electron-beam projection lithography (EPL) mask.
| Autor: | Yamada, Yasuhisa, Kobinata, Hideo, Tamura, Takao, Miyasaka, Mami, Sakamoto, Tatsuya, Ogawa, Yuzo, Takada, Kenichi, Yamashita, Hiroshi, Nozue, Hiroshi |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p473-482, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|