Highly accurate CD control at stitching region for electron-beam projection lithography.
| Autor: | Fujiwara, Tomoharu, Irita, Takeshi, Shimizu, Sumito, Yamamoto, Hajime, Suzuki, Kazuaki |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p727-735, 9p |
| Databáze: | Complementary Index |
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