Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography.
| Autor: | Fritze, Michael, Tyrrell, Brian, Astolfi, David K., Davis, Paul, Wheeler, Bruce, Mallen, Renee D., Jarmolowicz, J., Cann, Susan G., Chan, David Y., Rhyins, Peter D., Mastovich, Martin E., Sullivan, Neal T., Brandom, Robert, Carney, Chris, Ferri, John E., Blachowicz, B. A. |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p334-343, 10p |
| Databáze: | Complementary Index |
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