New polymer for 157-nm single-layer resist based on fluorine-containing acryl copolymer.
| Autor: | Ogata, Toshiyuki, Endo, Koutaro, Komano, Hiroshi, Nakayama, Toshimasa |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p1048-1055, 8p |
| Databáze: | Complementary Index |
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