Comparison of acid-generating efficiencies in 248 and 193-nm photoresists.
| Autor: | Cameron, James F., Chan, Nicholas, Moore, Kathryn, Pohlers, Gerd |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p106-118, 13p |
| Databáze: | Complementary Index |
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