Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform.
| Autor: | Kim, Keeho, Wells, Gregory M., Kim, Won D., Choi, Yong-Jun, Choi, Se-Jin, Kim, Yang-Sook, Kim, Deog-Bae |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p168-178, 11p |
| Databáze: | Complementary Index |
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