Mechanism studies of scanning electron microscope measurement effects on 193-nm photoresists and the development of improved line-width measurement methods.
| Autor: | Sarrubi, T. R., Ross, Matthew F., Neisser, Mark, Kocab, Thomas, Beauchemin Jr., Bernard T., Livesay, William R., Wong, Selmer S., Ng, Waiman |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p211-221, 11p |
| Databáze: | Complementary Index |
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