Silicon-containing resists for 157-nm applications.
Autor: | Sooriyakumaran, Ratnam, Fenzel-Alexander, Debra, Fender, Nicolette, Wallraff, Gregory M., Allen, Robert D. |
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Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p319-326, 8p |
Databáze: | Complementary Index |
Externí odkaz: |