Development of DUV resists for zero angle and angled implant applications.

Autor: Fallon, Patricia, Cronin, Michael F., Lachowski, Joseph, Valerio, Pasquale R., Bachetti, Larry, Georger Jr., Jacque H., Mori, Mike, Tomes, David N., Wynja, Kim
Zdroj: Proceedings of SPIE; Nov2001, Issue 1, p601-609, 9p
Databáze: Complementary Index