Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/tert-butyl acrylate).
| Autor: | Houlihan, Francis M., Person, Donna, Nalamasu, Omkaram, Rushkin, Ilya, Dimov, Ognian N., Reichmanis, Elsa |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p67-77, 11p |
| Databáze: | Complementary Index |
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