Photolithographic evaluation of deep UV resist materials for mask-making applications.
| Autor: | Montgomery, Warren, Buxbaum, Alex H., Rodrigues, William, Albelo, Jeff A., Fuller, Scott E. |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p673-679, 7p |
| Databáze: | Complementary Index |
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