Novel conformal organic antireflective coatings for advanced I-line lithography.
| Autor: | Deshpande, Shreeram V., Nowak, Kelly A., Fowler, Shelly, Williams, Paul, Arjona, Mikko |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p855-863, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|