Mechanical analysis of hard pellicles for 157-nm lithography.
| Autor: | Reu, Phillip L., Mikkelson, Andrew R., Schlax, Michael P., Cotte, Eric P., Siewert, Lowell K., Engelstad, Roxann L., Lovell, Edward G., Dao, Giang T., Zheng, Jun-Fei |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p1166-1174, 9p |
| Databáze: | Complementary Index |
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