Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth.
| Autor: | Lalovic, Ivan, Kroyan, Armen, Farrar, Nigel R., Taitano, Dennis, Zambon, Paolo, Smith, Adlai H. |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p1262-1271, 10p |
| Databáze: | Complementary Index |
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