Optimum mask and source patterns to print a given shape.
Autor: | Rosenbluth, Alan E., Bukofsky, Scott J., Hibbs, Michael S., Lai, Kafai, Molless, Antoinette F., Singh, Rama N., Wong, Alfred K. K. |
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Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p486-502, 17p |
Databáze: | Complementary Index |
Externí odkaz: |