Optimum mask and source patterns to print a given shape.

Autor: Rosenbluth, Alan E., Bukofsky, Scott J., Hibbs, Michael S., Lai, Kafai, Molless, Antoinette F., Singh, Rama N., Wong, Alfred K. K.
Zdroj: Proceedings of SPIE; Nov2001, Issue 1, p486-502, 17p
Databáze: Complementary Index