Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography.

Autor: French, Roger H., Gordon, Joseph S., Jones, David J., Lemon, M. F., Wheland, Robert C., Zhang, Xun, Zumsteg Jr., Fredrick C., Sharp, Kenneth G., Qiu, Weiming
Zdroj: Proceedings of SPIE; Nov2001, Issue 1, p89-97, 9p
Databáze: Complementary Index