100-nm gate lithography for double-gate transistors.
| Autor: | Krasnoperova, Azalia A., Zhang, Ying, Babich, Inna V., Treichler, John, Yoon, Jung H., Guarini, Kathryn, Solomon, Paul M. |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p925-935, 11p |
| Databáze: | Complementary Index |
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